The SUSS MA6 mask aligner is designed for high resolution photolithography. It can accommodate 6-inch wafers and substrates up to 6 x 6 inch. This system is capable of 0.6-micron resolution in vacuum contact mode.
Mask Aligner – SUSS MA6
The SUSS MA6 mask aligner is designed for high resolution photolithography. It can accommodate 6-inch wafers and substrates up to 6 x 6 inch. This system is capable of 0.6-micron resolution in vacuum contact mode.