Click on an image below to learn more about our equipment and reserve time in the Class 100 Clean Room, Materials Synthesis and Processing or the Characterization Lab.
See our core rates summary for user and training rates.
Contact Joseph Mathai (mathaic@missouri.edu ) for training.
Materials Characterization
Atomic Force Microscopy – Bruker Innova AFM Optical Profilometer – Vecco NT9109 Ellipsometer – VASE J A Woolam Contact Angle Gonimeter – ramé-hart Model 200 Particle Size and Zeta Potential – Anton Paar Litesizer DLS 701 TGA/DSC – TA instruments Discovery SDT 650 DSC – TA instruments DSC Q20 Thermal Conductivity Meter – DTC 20 Semiconductor Parameter Analyzer – Keithley 4200 SCS/Cryogenic probe station Deep-Level Transient Spectroscopy DLTS-Semi lab 83D Hall Effect Measurement System – Linseis HCS1 Nano indenter – Agilent G200 Nanoindenter Nano indenter – Bruker TI Premier TriboIndenter Dynamic Mechanical Analyzer – Hitachi DMA7100 Vickers hardness measuremeant – Buehler Micromet T514 US-Vis Spectroscopy – Shimadzu UV-2401 UV-Vis Spectroscopy – PerkinElmer Lambda 25 FTIR – Nicolet 4700 FTIR-ATR-IR Microscope – Bruker Invenio and Hyperion IR Raman Spectroscopy – Renishaw InVia X-ray Diffraction – Rigaku Ultima IV – Powder and Hyperion IR
Cleanroom Instruments
Magnetron Sputtering System – AJA ATC2000V Thermal Evaporator – KJ Lesker Nano38 E-beam Deposition – BOC Temescal BJD-1800 Atomic Layer Deposition (ALD) – Cambridge Savannah 200 Parylene Coater – SCS PDS2010 Mask Aligner – SUSS MA6 Two Photon Polymerization 3D Printer – Nanoscribe Quantum X Shape Rapid Thermal Annealing – Heatpulse 610 Oxygen Plasma Cleaner Xenon Difluoride Etcher
