Kurt Lesker Axxix E-beam evaporator is four pocket e-beam deposition system. This system can sequentially deposit four different materials like metal and oxides. Process parameters like rate of deposition, thickness, and substrate temperature are computer-controlled. This unit can handle 8-inch wafers and the substrate can be heated to 500 oC.
Evaporation materials: Ti, Cr, Au, Ag, Al, Si, Ta, Al2O3
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